Silicon

Polysilicon is the starting material for the production of wafers for the electronics- and photovoltaics industries.
The monosilane based polysilicon production process developed by SCHMID Silicon Technology (SST) features highest purity at low cost. The material is suitable for the production of multi-crystalline, mono-crystalline (CZ) and Float Zone (FZ) wafers.


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Innovative steps lead from metallurgical grade silicon to polysilicon. In the SST monosilane process for production of polysilicon, recycling of intermediate products such as TCS and hydrogen is achieved by closed loops. The process is structured in a straight-forward way, consisting of three main production units:

  • Low pressure Hydrochlorination unit
  • Monosilane Disproportionation unit based on reactive distillation
  • Monosilane based Chemical Vapor Deposition unit (CVD)

All units and therefore the entire SST process is characterized by lowest energy and feedstock consumption and thus resulting in lowest operation cost.

>Further information

The process is more easily to be run than conventional production methods. Because the monosilane-process works only with Si and H2, and not with chlorine, this technology provides for enormous development potential in the crystalline value chain.

The high level of purity enables application of the polysilicon for the solar industry, as well as for all applications in the electronics industry.

Further information

Low Pressure Hydrochlorination

  • > 25% STC conversion rate
  • automated solids treatment and removal, with 95% solids content

One Step Disproportionation

  • reactive distillation saves one reactor and one column
  • significant savings in energy consumption
  • operates with DCS or TCS or any combination of the two

Monosilane Chemical Vapor Deposition

  • ˃300 MT/a/reactor
  • power consumption <30 kWh/kg

Entire process

  • Superior Product Quality 9-11N+ at lowest energy consumption