Unlike standard cells and PERC, which both use an aluminum-alloy BSF, PERT (Passivated Emitter Rear Totally Diffused) cells have a diffused rear surface. That means, with p-PERT the emitter of p-type based wafer is formed with phoshphorus diffusion and BSF is realized with boron doping. PERT cells do not show the considerably light-induced degradation and can be adapted to bifacial.

SCHMID’s PERT Solution:

• High efficiency by passivation on multi material
• Boron BSF PERT multi cells show no light-induced degradation (LID) unlike PERC cells
• Same cost of ownership as for PERC cells
• Smart process by proven equipment: SCHMID’s PERT technology is based on APCVD (Atmospheric Pressure Chemical Vapor Deposition) systems that have been used in industry with high acceptance for more than 10 years
• Formation of phosphorus emitter and boron BSF in one thermal cycle with Horizontal Tube Furnace
• PERT cells can be used in conventional backsheet modules
• Reconfiguration of the production line (PERT monofacial to bifacial) within hours

• PERT line can be used for bifacial cells as well
• High flexibility
• Complete technology out of one hand
• Proven process equipment