The developer removes the photoresist from the surfaces that are to be etched in the next process step.

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Thanks to the optimized bath duct and a defoaming device no additional anti-foam chemical is necessary. Furthermore, controlled replenishment of the developing solution ensures reliable removal of the resist.

  • Development without de-foaming thanks to an optimized bath duct
  • Controlled dosing of the developer solution in the post developer guarantees optimized development processes and reliable removal of the resist