Developing | SCHMID Group

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Thanks to the optimized bath duct and a defoaming device no additional anti-foam chemical is necessary. Furthermore, controlled replenishment of the developing solution ensures reliable removal of the resist.

Development without de-foaming thanks to an optimized bath duct
Controlled dosing of the developer solution in the post developer guarantees optimized development processes and reliable removal of the resist

Related Products

The acid etching is the first choice when etching innerlayers. Copper chloride, sulfuric acid or iron-III-chloride is used to remove the exposed co... >more

Alkaline Etching

The alkaline etching is the first choice when etching outerlayers. To remove the exposed copper a strong alkaline ammonia-based solution is used. >more

The developer removes the photoresist from the surfaces that are to be etched in the next process step.

The stripper removes the remaining photoresist on the circuits.

Inline system for the regeneration of alkaline etching chemicals and copper in a closed-loop System.

Highlights 2021

New Etching Options

InfinityLine V+