Developing | SCHMID Group

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Thanks to the optimized bath duct and a defoaming device no additional anti-foam chemical is necessary. Furthermore, controlled replenishment of the developing solution ensures reliable removal of the resist.

Development without de-foaming thanks to an optimized bath duct
Controlled dosing of the developer solution in the post developer guarantees optimized development processes and reliable removal of the resist

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The developer removes the photoresist from the surfaces that are to be etched in the next process step.

Inline system for the regeneration of alkaline etching chemicals and copper in a closed-loop System.

The acid etching is the first choice when etching innerlayers. Copper chloride, sulfuric acid or iron-III-chloride is used to remove the exposed co... >more

Alkaline Etching

The alkaline etching is the first choice when etching outerlayers. To remove the exposed copper a strong alkaline ammonia-based solution is used. >more

The stripper removes the remaining photoresist on the circuits.

Highlights 2021

InfinityLine V+

New Etching Options