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Unlike standard cells and PERC, which both use an aluminum-alloy BSF, PERT (Passivated Emitter Rear Totally Diffused) cells have a diffused rear surface. That means, with p-PERT the emitter of p-type based wafer is formed with phoshphorus diffusion and BSF is realized with boron doping. PERT cells do not show the considerably light-induced degradation and can be adapted to bifacial.


  • High efficiency by passivation on multi material
  • Boron BSF PERT multi cells show no light-induced degradation (LID) unlike PERC cells
  • Same cost of ownership as for PERC cells
  • Smart process by proven equipment: SCHMID’s PERT technology is based on APCVD (Atmospheric Pressure Chemical Vapor Deposition) systems that have been used in industry with high acceptance for more than 10 years
  • Formation of phosphorus emitter and boron BSF in one thermal cycle with Horizontal Tube Furnace
  • PERT cells can be used in conventional backsheet modules
  • Reconfiguration of the production line (PERT monofacial to bifacial) within hours
Acid TexturingAPCVDAcid TexturingAPCVDHorizontal Tube FurnaceEdge Isolation
Texturing & polishingBSG formation BSFFront side cleaning & conditioningPSG formation emitterBoron & Phosphorus Co-diffusionPSG-removal


  • PERT line can be used for bifacial cells as well
  • High flexibility
  • Complete technology out of one hand
  • Proven process equipment