Low cost inline deposition of thin films
The SCHMID APCVD System offers the lowest cost alternative for dielectric film deposition. In the roller transport system, only the substrate is heated during the process, so electricity and cooling requirements are greatly reduced. Multiple injector heads can be used in series within a single APCVD system. Three tiers of graded, power saving insulation further reduce energy
bills. The inline system is available in two configurations: with belt transport or with roller transport. Each transport method has its advantages.
The production proven APCVD System from SCHMID includes multiple injector heads in series to maximize process throughput, uniformity, and flexibility while minimizing cost. The world class HMI allows the customer to easily monitor and control all process parameters in a user-friendly touchscreen environment. The maintenance-conscious design allows chemical
injectors and exhaust ducting to be cleaned while in place on the system and without significant process interruption. Modular chemical vapor injector head assemblies allow quick and easy installation and removal from the coating chamber. All injector head parts are durable precision machined structures ensuring accurate chemical delivery even after extended use.
Thermal systems from SCHMID have become famous for process stability, and the APCVD system continues this tradition. Stable, unsurpassed temperature uniformity control ensures consistent process results. In addition, precision process exhaust and precursor flow controls guarantee consistent film results.
- Undoped SiO2 (USG)
- Boron doped SiO2 (BSG)
- Phosphorous doped SiO2 (PSG)