CMP – made by SCHMID

Chemical Mechanical Polishing

The novel large substrate SCHMID chemical mechanical polishing (CMP) line has emerged out of the semiconductor world into printed PCB manufacturing as a critical step for next generation multi-layer boards and substrates. For achieving global surface polishing of plated copper with outstanding uniformity, an always well-defined form factor of the dielectric as well as copper lines, planes and vias is achieved.

Product benefits

Solution for high-end HDI+ and IC substrates with structures down to 2μm

Best in class process which combines material flexibility with leveling uniformity

Field proven solution suited for large substrate sizes up to 25” x 25”

Offers a new universe for PCB design in combination with the SCHMID embedded trace technology


The Oscar type of polishing setup achieves fastest planarization with minimal dishing for all kinds of copper-crystal structures. Along with the SCHMID process know how CMP delivers an optimal polishing process resulting in a perfect synergy between uniformity and removal rate.

In particular, in new processes like embedded traces, HAR via filling or mSAP/SAP, CMP is a key to high yield and access to new low DK epoxy materials.

The CMP as a part of the SCHMID embedded trace technology supports all requirements for industry 4.0. Different interfaces to customers MES are available. The web-based HMI allows to run and control the system from different devices.

Technical data

Head: Ø 930 mm, 30-100 rpm, max. 1450 kg, ±15° swing range @ 0-5 rpm

Platen: Ø 1300 mm, 30-100 rpm with cooling structure

Pumps: 2 slurry pumps for separate slurry supply, 0,980 l/min each

Loading & Unloading: manually, dry-in/wet-out

Conditioner: Swing arm type nylon brush

Control: PLC & Touch Screen

Structure: Simple, robust and high rigidity

High uniformity: NU < 10 %

Repeatability: WTWNU < 7 %

Planarisation factor: ~ 2

Removal rate: ~3μm/min

Dishing: <2μm

Working size: Max. 915 mm (36 inch) Ø

Dimensions: 2600x2700x2500 mm (WxDxH)


We look forward to getting to know you!

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Tracy Xie


Johnny Tseng


Jaho Kim